Novel high-performance nanostructured thin films with superior structural and functional properties are required for advanced applications such as micro-/nanoelectronics, energy production, sensors and wear protection. Especially, mutually excluding structural properties such as high strength and ductility need to be combined, but also resistance to harsh environments such as corrosive environment, wear, and high temperature must be improved. Key to control the properties is the film architecture and microstructure. In order to trigger microstructure induced material properties control of the micro-scale porosity, atomic composition, average grain size, phase distribution, and layer/film thickness must be optimized.
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