Frank, A.; Dias, M.; Hieke, S. W.; Kruth, A.; Scheu, C.: Spontaneous fluctuations in a plasma ion assisted deposition – correlation between deposition conditions and vanadium oxide thin film growth. Thin Solid Films 722, 138574 (2021)
Frank, A.; Dias, M.; Hieke, S. W.; Kruth, A.; Scheu, C.: Electron microscopic investigation of the influence of plasma parameters on VOx films deposited by a plasma ion assisted process. E-MRS 2019 Spring Meeting, Nice, France (2019)
International researcher team presents a novel microstructure design strategy for lean medium-manganese steels with optimized properties in the journal Science
The full potential of energy materials can only be exploited if the interplay between mechanics and chemistry at the interfaces is well known. This leads to more sustainable and efficient energy solutions.