Frank, A.; Dias, M.; Hieke, S. W.; Kruth, A.; Scheu, C.: Spontaneous fluctuations in a plasma ion assisted deposition – correlation between deposition conditions and vanadium oxide thin film growth. Thin Solid Films 722, 138574 (2021)
Frank, A.; Dias, M.; Hieke, S. W.; Kruth, A.; Scheu, C.: Electron microscopic investigation of the influence of plasma parameters on VOx films deposited by a plasma ion assisted process. E-MRS 2019 Spring Meeting, Nice, France (2019)
Scientists of the Max-Planck-Institut für Eisenforschung pioneer new machine learning model for corrosion-resistant alloy design. Their results are now published in the journal Science Advances
Ever since the discovery of electricity, chemical reactions occurring at the interface between a solid electrode and an aqueous solution have aroused great scientific interest, not least by the opportunity to influence and control the reactions by applying a voltage across the interface. Our current textbook knowledge is mostly based on mesoscopic…