Publications of Alfred Ludwig

Garzón-Manjón, A.; Zhang, S.; Völker, B.; Meischein, M.; Ludwig, A.; Scheu, C.: Exploring stability of a complex solid solution thin film by in-situ heating transmission electron microscopy. MRS Bulletin 47 (8), pp. 371 - 378 (2022)

Chakraborty, J.; Oellers, T.; Raghavan, R.; Ludwig, A.; Dehm, G.: Microstructure and residual stress evolution in nanocrystalline Cu–Zr thin films. Journal of Alloys and Compounds 896, 162799 (2022)

Oellers, T.; Arigela, V. G.; Kirchlechner, C.; Dehm, G.; Ludwig, A.: Thin-Film Microtensile-Test Structures for High-Throughput Characterization of Mechanical Properties. ACS Combinatorial Science 22 (3), pp. 142 - 149 (2020)

Kasian, O.; Geiger, S.; Stock, P.; Polymeros, G.; Breitbach, B.; Savan, A.; Ludwig, A.; Cherevko, S.; Mayrhofer, K. J. J.: On the origin of the improved ruthenium stability in RuO₂ - IrO₂ mixed oxides. Journal of the Electrochemical Society 163 (11), pp. F3099 - F3104 (2016)

Oellers, T.: Development of combinatorial methods to tailor electrical and mechanical properties of Cu-based thin-film structures. Dissertation, Ruhr-Universität Bochum (2022)