Frank, A.; Dias, M.; Hieke, S. W.; Kruth, A.; Scheu, C.: Spontaneous fluctuations in a plasma ion assisted deposition – correlation between deposition conditions and vanadium oxide thin film growth. Thin Solid Films 722, 138574 (2021)
Frank, A.; Dias, M.; Hieke, S. W.; Kruth, A.; Scheu, C.: Electron microscopic investigation of the influence of plasma parameters on VOx films deposited by a plasma ion assisted process. E-MRS 2019 Spring Meeting, Nice, France (2019)
If manganese nodules can be mined in an environmentally friendly way, the critical metals needed for the energy transition could be produced with low CO2 emissions
Alper Kasirga wins the Max Planck Apprenticeship Award and the Max Planck Institute for Sustainable Materials is recognised as an excellent training institution