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Dandapani, V.; Tran, T. H.; Bashir, A.; Evers, S.; Rohwerder, M.: Hydrogen Permeation as a Tool for Quantitative Characterization of Oxygen Reduction Kinetics at Buried Metal-Coating Interfaces. Electrochimica Acta 189, pp. 111 - 117 (2016)

Dandapani, V.; Altin, A.; Merola, C.; Bashir, A.; Heinen, E.; Rohwerder, M.: Probing the buried metal-organic coating interfacial reaction kinetic mechanisms by a hydrogen permeation based potentiometric approach. Journal of the Electrochemical Society 163 (13), pp. C778 - C783 (2016)

Rohwerder, M.; Dandapani, V.: A Novel Potentiometric Approach to a Quantitative Characterization of Oxygen Reduction Kinetics at Buried Interfaces. 11th International Symposium on Electrochemical Micro & Nanosystem Technologies (EMNT2016), Brussels, Belgium (2016)

Dandapani, V.: Hydrogen Permeation based Potentiometry as a New Quantification Tool for Electrochemical Reactivity at Buried Interfaces and under Nanoscopic Electrolyte Layers. Dissertation, Ruhr-Universität Bochum, Bochum, Germany (2017)