Konferenzbeitrag
Huang, R.; Robl, W.; Dehm, G.; Ceric, H.; Detzel, T.: Disparate tendency of stress evolution of thin and thick electroplated Cu films at room temperature. In: Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, 5532222, S. 1 - 6. International Symposium on the Physical and Failure Analysis of Integrated Circuits IPFA 2010, Singapore, Singapore, 05. Juli 2010 - 09. Juli 2010. IEEE (2010)